CH8653 - PROCESS INSTRUMENTATION, DYNAMICS AND CONTROL (Syllabus) 2017-regulation Anna University

CH8653 - PROCESS INSTRUMENTATION, DYNAMICS AND CONTROL (Syllabus) 2017-regulation Anna University

CH8653	PROCESS INSTRUMENTATION, DYNAMICS AND CONTROL	LPTC

3003

OBJECTIVE:

• To introduce open and closed loop systems and its responses, control loop components and stability of control systems along with instrumentation.

UNIT I	INSTRUMENTATION	9

Principles of measurements and classification of process instruments, measurement of temperature, pressure, fluid flow, liquid weight and weight flow rate, viscosity, pH, concentration, electrical and thermal conductivity, humidity of gases.

UNIT II	OPEN LOOP SYSTEMS	9

Laplace transformation and its application in process control. First order systems and their transient response for standard input functions, first order systems in series, linearization and its application in process control, second order systems and their dynamics; transportation lag.

UNIT III	CLOSED LOOP SYSTEMS	10

Closed loop control systems, development of block diagram for feed-back control systems, servo and regulatory problems, transfer function for controllers and final control element, principles of pneumatic and electronic controllers, transient response of closed-loop control systems and their stability.

UNIT IV	FREQUENCY RESPONSE	9

Introduction to frequency response of closed-loop systems, control system design by frequency response techniques, Bode diagram, stability criterion, tuning of controllers Z-N tuning rules, C-C tuning rules.

UNIT V	ADVANCED CONTROL SCHEMES	8

Feedback control of systems with dead time and inverse response. Control systems with multiple loops. Advanced Control Schemes a) Feed forward b) ratio control. control of distillation towers and heat exchangers,

TOTAL : 45 PERIODS

OUTCOME:

• Students will understand and discuss the importance of process control in process operation and the role of process control engineers They also understand and design the modern hardware and instrumentation needed to implement process control.

TEXT BOOKS:

1. Coughnowr, D., “ Process Systems Analysis and Control “, 3rd Edn., McGraw Hill, New York, 2008.
2. Stephanopoulos, G., “Chemical Process Control“, Prentice Hall of India, 2003

REFERENCES:

1. Dale E. Seborg, Thomas F. Edgar, Duncan A. Mellichamp , Process dynamics and control 1-2nd ed. John Wiley & Sons, Inc.
2. Marlin, T. E., “ Process Control “, 2nd Edn, McGraw Hill, New York, 2000.
3. Smith, C. A. and Corripio, A. B., “Principles and Practice of Automatic Process Control”, 2nd Edn., John Wiley, New York, 1997.
4. Jason L. Speyer, Walter H. Chung, ”Stochastic Processes, Estimation, and Control”, PHI Ltd (2013).